• Key Dates
  • Abstract Submission

    From May 15 (Monday) to October 6 (Friday), 2023

    November 30 (Thursday)

  • Notification of Abstract Acceptance

    November 17 (Friday), 2023

  • Final Program Notification

    December 15 (Friday), 2023

Plenary Speaker

"Modeling of Modern Plasma Processing Reactors: Plasma Physics and Surface Chemistry"


Princeton Plasma Physics Laboratory, USA

"Large-Scale Synthesis of 2-Dimensional Transition Metal Dichalcogenides (TMDCs) by Low-Temperature Plasma and their Applications"

Prof. Taesung Kim

Sungkyunkwan University, Korea

"Plasma Monitoring in Semiconductor Manufacturing: Yesterday, Today and Tomorrow - Tiny Things make Wonder"

Dr. Yongjin KIM

SK Hynix Inc., Korea

"Asymmetry and Instability in Capacitively Coupled Plasmas Sustained in Electronegative Mixed Gases"

Prof. Yuan-Hong SONG

Dalian University of Technology, China

“Plasma Assisted Atomic Layer Etching of 2D Materials”

Prof. Geun Young YEOM

Sungkyunkwan University, Korea

"Recent Trends in Semiconductor Manufacturing Equipment"

Dr. Seok-min YUN

Samsung Electronics Co., Ltd., Korea