ICMAP 2024 :: The 9th International Conference on Microelectronics and Plasma Technology

Tutorial Session

[Tutorial Session 1] Analytical Techniques and their Application ▪ January 15 (Monday) / Room C (Sapphire B)

Speakers		“Soft X-ray Spectroscopy; Principle and Applications” Introduction : Soft x-rays provide a powerful probing method for the electronic structure of materials. This lecture introduces the principle of X-ray interaction with electrons and how to apply them to spectroscopic analysis. Dr. Kyuwook Ihm Pohang Accelerator Laboratory Ph.D. in physics, POSTECH (2009) ᆞ Scientist in PAL (2001~) ᆞ SAMSUNG elec. Co. (2000~2001) ᆞ Visiting scientist in LBNL, USA (2016) ᆞ Visiting scientist in Elettra, Italy (2003) Scientific field ᆞ Physics and chemistry of condensed matter; low-dimensional materials, topological matter and strongly correlated system. Experimental methods ᆞ Soft X-ray spectroscopy; PES, NEXAFS, XES including RIXS. ᆞ Photoemisson electron microscopy (PEEM)
		“Fundamentals and Applications of Secondary Ion Mass Spectrometry” Introduction : Secondary ion mass spectrometry (SIMS) is a surface analysis equipment that can analyze the surface component information and distribution. In particular, SIMS is a very good surface analysis equipment for analyzing trace elements. I will talk about the principles and applications of SIMS, which is important in advanced materials research. Dr. Tae Eun Hong Korea Basic Science Institute Education ᆞ Ph.D. in physics, Pusan National University (2012) ᆞ M.S. in Physics, Pusan National University (2008) ᆞ B.S. in Physics, Pusan National University (1996) Work Experiences 2006 ~ Principal Researcher in KBSI (2006~) 1996 ~ 2005 SK Hynix Semiconductor (1996~2005) 2017 Visiting Scientist in University of Texas at Austin, USA Research Field ᆞ Development of Surface Analysis Technique using SIMS ᆞ Surface Modification using Atomic Layer Deposition for Power Semiconductor Experimental Methods ᆞ Secondary Ion Mass Spectrometry; ims-6f, ims-7f Auto, Nano SIMS ᆞ Scanning Probe Microscope (SPM) : Nano Wizard II ᆞ Atomic Layer Deposition (ALD) : NCD HT-100
		“Application of Monochromated and Cs Corrected STEM/EELS for Functional Materials” Introduction : In this session, I will introduce transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS), which are responsible for structural and chemical analysis at the atomic level. In particular, the atomic-level imaging structural analysis using the Cs corrector is essential analysis method for semiconductor and nano technology. Monochromated EELs will be covered in this lecture. Dr. Jae Hyuck Jang Korea Basic Science Institute Research Interests ᆞ Electron structure study by monochromated ultra high resolution EELS. (low/core loss) ᆞ Atomic structure analysis by Cs corrected S TEM for oxide materials/semiconductor device / 3 D FINFET device / 2D materials / Catalysts ᆞ Energy related materials (Oxygen vacancy behaviors in the interface of the hetero oxide) Education & Career 2007 ~ 2011 Seoul National University, Department of Materials Science and Engineering, Ph.D. 2011 ~ 2015 Oak Ridge National Lab. Post-doc 2015 ~ 2016 Samsung Electronics Co., Ltd., Senior Researcher 2016 ~ Korea Basic Science Institute, Senior Researcher
		“Crystal Structure Analysis with Synchrotron X-ray Diffraction” Introduction : Synchrotron X-ray diffraction is widely used to analyze the crystal structure of materials. This tutorial introduces how to interpret X-ray diffraction patterns through diffraction peak positions, peak intensities, and peak profiles. We will also discuss several research cases based on high resolution synchrotron X-ray diffraction techniques from the PLS-II beamline. Dr. Young Hwa Jung Pohang Accelerator Laboratory Major Field ᆞ Synchrotron powder X-ray diffraction ᆞ Synthesis and energy application of ceramic materials ᆞ Electrode materials for advanced rechargeable batteries ᆞ Crystal structural analysis of inorganic solids based on Rietveld refinement Education ᆞ B. S. in Materials Science and Engineering, KAIST, 2003. ᆞ M. S. in Materials Science and Engineering, KAIST, 2005. ᆞ Ph. D. in Materials Science and Engineering, KAIST, 2015. Work Experiences 2016 ~ Present Senior Researcher, Pohang Accelerator Laboratory ( PA L ) , POSTECH 2015 Postdoctoral Researcher, Materials Science and Engineering, KAIST 2006 ~ 2012 Researcher, Battery Research Center, LG Chem

[Tutorial Session 2] Atomic Layer Process (ALD & ALE) ▪ January 16 (Tuesday) / Room A (Emerald Hall)*Korean Only

연사		“Trend of Atomic Layer Etching” 강연설명: These days, atomic layer etching technologies are widely investigated by researchers from academy and equipment industry. In this tutorial, the backgrounds, current status, and future aspects of atomic layer etching technologies for next generation semiconductor device fabrication will be presented. 염근영 교수 성균관대학교 Geun Young Yeom was born in 1958 in Korea. He received the Ph.D. degree from University of Illinois at Urbana-Champaign in 1989. From 1992 to 2022, he was a Professor of Materials Science and Engineering Department at Sungkyunkwan University. Currently, He is a Distinguished Professor in the same department. He is interested in plasma processing related to etching and deposition. Especially, he is interested in various next generation plasma etch processing such as plasma etching of dielectric materials using low global warming gases, processing of 2 dimensional materials such as transition metal dichalcogenides, atomic layer/cyclic etching of various materials, etc. He was presidents of Korean Materials Research Society and Korean Vacuum Society and is currently vice presidents of the Korean Society of Surface Science and Engineering and the Korean Society of Semiconductor & Display Technology.
		“Basics of ALD and ASD” 강연설명: Atomic layer deposition (ALD) is a key technique that enables atomic scale film deposition for device fabrication. Also, recently area-selective ALD (AS-ALD) has been spotlighted since it allows the deposition of patterns without additional photolithography technique. This talk covers basic knowledge and research trend of ALD and AS-ALD and aims to provide how to approach them for semiconductor devices. 오일권 교수 아주대학교 Il-Kwon Oh is an assistant professor in the Department of Intelligence Semiconductor Engineering and Electrical and Computer Engineering at Ajou University. He received his B.S., and Ph.D. degrees from the Department of Electrical and Electronic Engineering at Yonsei University in 2012, and 2016, respectively. Prof. Oh’s current research interests and topics are focused on fabricating emerging electronic devices with nanostructured materials and especially, cover wide range of semiconductor fields; 1) the fabrication and evaluation of electronic devices including in semiconductor/memory devices, 2) the fabrication and elucidating of new concepts of electronic devices with novel nanostructures by controlling surface chemical reaction. So far, 75 SCI/SCIE papers, 61 patents, 5 technology transfer, and many awards support his professional background on semiconductor and atomic scale fabrication.
		“Theoretical Approach of Atomic Layer Deposition (ALD)/Atomic Layer Etching” 강연설명: In atomic layer deposition (ALD) and atomic layer etching (ALE), topographical issues combined with surface reactions are emerging as critical knowledge for the fabrication processes of next-generation devices. This presentation focuses on the details of ALD/ALE topography simulation for 3D memory and logic devices. 임연호 교수 전북대학교 Education & Career 2001. Ph. D., Department of Chemical Engineering, Jeonbuk National University, South Korea 2002 ~ 2003 Post-Doc., Focus Center-NewYork for Gigascale Integration, Rensselaer Polytechnic Institute, USA 2003 ~ 2005 Senior Research Engineer, Memory Division, Samsung Electronics Co. Ltd., South Korea 2014 ~ 2015 Visiting Scholar, University of California, Berkeley, USA 2016 ~ 2018 Head, Division of Chemical Engineering, Jeonbuk National University 2005 ~ Now Professor, Division of Chemical Engineering, Jeonbuk National University Research Interest 3D topography simulation of plasma processing based on plasma diagnostic ᆞ Plasma diagnostics and plasma etch & deposition experiments ᆞ Plasma surface reaction modeling ᆞ Development of GPU based 3 dimensional simulators for free surface evolution ᆞ 3D topography simulations of plasma processing [Development of commercialized version of K-SPEED] Chemical and Biological Nanosensors Chemical and biochemical modification of semiconductor devices using plasma deposition Gas, and selective metal ion detections using solid-state nanodevices Real-time, and label-free biological detection with solid-state nanodevices
		“Understanding Radical Generation and Transmission Mechanisms for Optimization of PEALD Processes and Equipment” 강연설명: 플라즈마를 활용한 원자층 증착 공정에 대한 물리/화학적 기초 내용의 전달을 목표로 한다. 플라즈마에서 생성되는 높은 에너지의 이온은 디바이스에 무시 못할 피해를 줄 수 있고, 이러한 상황의 대비를 위한 라디칼의 생성 및 이용과 그 라디칼에 대한 전달 현상에 대해 강의한다. 김호준 교수 한양대학교 Education & Career 2008 ~ 2014 삼성전자 메모리사업부 책임 2014 ~ 2018 삼성전자 메모리사업부 수석 2018 ~ 2020 동아대학교 기계공학과 조교수 2020 ~ 2022 가천대학교 기계공학과 조교수 2022 ~ 2022 가천대학교 기계∙스마트∙산업공학부 조교수 2019 ~ 2020 SK Hynix社 자문교수 2020 ~ 2022 테스社 자문교수 2022 ~ 한양대학교 기계공학과 교수

[Tutorial Session 3] 시뮬레이션 및 진단 ▪ January 16 (Tuesday) / Room B (Sapphire A)*Korean Only

연사		“COMSOL Multiphysics Plasma Simulation” 강연설명: Comsol Multiphysics의 Plasma 해석 분야에 대한 간단한 소개와 Plasma 장비 개발을 위한 수치 해석 시뮬레이션 이기환 전산해석매니저 알트소프트 이기환은 고려대학교에서 석,박사 통합과정으로 고체물리학을 전공하였고, 고려대학교 이과대학 공동기기실 PPMS 장비 오퍼레이터와 고려대학교 물리학과 일반물리학 및 실험 강사, 초빙교수를 역임하였다. 2022년 1월 알트소프트에 합류하여 COMSOL Multiphysics Plasma 분야와 Semiconductor 분야에 대한 전산해석을 담당하고 있으며, 관련 분야에 대한 기술지원/교육/용역 을 진행하고 있다.
		“VizGlow와 K-PIC을 활용한 반도체 제조용 플라즈마 장비 시뮬레이션” 강연설명: 글로우 플라즈마 해석 S/W인 VizGlow의 소개와 이를 활용한 반도체 제조용 CCP/ICP 장비 해석 사례 설명 유동훈 이사 경원테크 ᆞ 충북대학교 전기공학 석사 ᆞ 전북대학교 화학공학 박사수료 ᆞ (주)경원테크 이사 ᆞ 전공분야 : 반도체 제조용 플라즈마 장비 시뮬레이션
		“플라즈마 전기적 진단법” 강연설명: 반도체/디스플레이 장비 및 공정 모니터링에 적용 가능한 전기적 진단법에 대한 소개와 사례 설명 이효창 교수 한국항공대학교 Education & Career 2012. 08 Ph.D., Department of Electrical Engineering @ Hanyang University (Korea) 2012 ~ 2015 Lecture Professor/Research Professor/Research Fellow @ Hanyang University (Korea) 2013 ~ 2013 Visiting Researcher @ Princeton Plasma Physics Laboratory, Princeton University (USA) 2015 ~ 2016 Senior Researcher @ Etch Technology Team, Memory division, Samsung Electronics (Korea) 2016 ~ 2023 Principal Research Scientist @ Korea Research Institute of Standards and Science (Korea) 2023 ~ Now Professor @ School of Electronics and Computer Engineering, Korea Aerospace University Representative Academic Activity & Honor ᆞ Prime Minister Award (Korea Invention Exhibition, 2021) ᆞ Professional Examiner (Korea Intellectual Property Tribunal, 2021~now) ᆞ IEEE Senior Member (2018) ᆞ Hershkowitz Early Career Award (IOP, 2020) ᆞ Distinguished Research Scientist (KRISS, 2020~2022) Publication ᆞ SCI papers: more than 90 (also, several review papers including Appl. Phys. Rev. 5, 011108 (2018)) ᆞ Patents: more than 30 Research Interest ᆞ Plasma sources, Plasma diagnostics, Plasma Material-Processing, Plasma Applications
		“플라즈마의 광학적 진단과 기술 : Optical Plasma Diagnostics” 강연설명: 저온 플라즈마의 광학적 진단 기술과 활용 사례 소개 박상후 교수 KAIST Career 2010.02 ~ 2016.02 Ph.D. in Plasma Physics at KAIST, Republic of Korea 2016.03 ~ 2017.04 Senior Engineer, Samsung Display 2017.04 ~ 2018.04 Postdoctoral Fellow, Natural Science Research Institute, KAIST 2018.04 ~ 2019.05 Research Assistant Professor, Nuclear and Quantum Engineering, KAIST 2019.06 ~ 2022.02 Senior Researcher, Korea Institute of Fusion Energy (KFE) 2022.03 ~ Present Assistant Professor, Nuclear and Quantum Engineering, KAIST Awards & Grants 2022.01.03 Best Paper Award (Emerging Scientist), Korea Institute of Fusion Energy (KFE) 2021.09.27 Young Researcher Award (U40), AAPPS-DPP 2020.03.01 Young Researcher Grants (3-year, total 450 Million KRW), NRF of Korea 2018.04.25 Emerging Scientist Award (Plasma Physics), Korean Physical Society

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